In the semiconductor manufacturing industry, the concept of process drift is becoming increasingly significant. A recent article discusses the importance of predicting and preventing process drift, a topic that resonates with the work we do at Savantech Ltd. Process drift refers to the gradual deviation of process parameters from their set points, which can subtly alter the electrical properties of chips, leading to functional and reliability issues. This can occur in any of the hundreds of process steps involved in manufacturing a single wafer.
At Savantech, we understand the criticality of such minor variances and have developed world-class Equipment Automation software solutions to tackle them. Our solutions help in maximising the productivity and flexibility of existing manufacturing facilities, thereby ensuring high yield and profitability.
The article highlights that even minor fluctuations in deposition rates during a chemical vapor deposition (CVD) process, for example, can lead to inconsistencies in layer uniformity, which can impact the electrical isolation properties essential for reliable circuit operation. Similarly, slight variations in a photolithography step can cause alignment issues between layers, leading to shorts or open circuits in the final device.
At advanced nodes and in dense advanced packages, where a nanometer can be critical, controlling process drift is vital for maintaining high yield and ensuring profitability. By rigorously monitoring and correcting for drift, engineers can ensure that production consistently meets quality standards, thereby maximising yield, and minimising waste.
We invite you to delve deeper into the complexities of process drift and discover how to unlock efficiency with Savantech: Tailored Solutions for Tomorrow.
Nuria Gómez
